Sciact
  • EN
  • RU

Mathematical Modeling of Charge Transport in the Dielectric Layer of a HfOx Memristor Taking into Account Single Charged Traps Научная публикация

Журнал Russian Microelectronics
ISSN: 1063-7397
Вых. Данные Год: 2025, Том: 54, Номер: 8, Страницы: 921–927 Страниц : 7 DOI: 10.1134/S1063739725601821
Ключевые слова memristor, ReRAM, hafnium oxide, charge transport
Авторы Islamov D.R. 1,2 , Zalyalov T.M. 1,2 , Voronkovskii V.A. 1 , Markelova A.K. 1 , Pil’nik A.A. 3 , Perevalov T.V. 1 , Davydov M.N. 2,4 , Chernov A.A. 1,2
Организации
1 Rzhanov Institute of Semiconductor Physics
2 Novosibirsk State University
3 Kutateladze Institute of Thermophysics
4 Lavrentyev Institute of Hydrodynamics

Реферат: The continuum and discrete charge transport models in the dielectric layer of a memristor for single charged traps taking into account the electric field from localized charges were developed. The probability rates of charge carrier hopping between traps, electron injection from the electrode to the nearest trap, and electron extraction from the nearest trap into the electrode were calculated using a model of phonon-coupled traps. It is shown that in weak external electric fields, the shielding effect of the electric field by localized charge carriers is significant, leading to incomplete filling of traps near the electrodes. It is found that for a moderate number of traps, the results obtained within the continuous model are very close to those obtained within the discrete model, but require greater computational power. The developed charge transport models were verified using experimental current-voltage curves for the high-resistance state of the TaN/HfOx/Ni memristor (x ≈ 1.8), measured in the temperature range 200 to 350 K.
Библиографическая ссылка: Islamov D.R. , Zalyalov T.M. , Voronkovskii V.A. , Markelova A.K. , Pil’nik A.A. , Perevalov T.V. , Davydov M.N. , Chernov A.A.
Mathematical Modeling of Charge Transport in the Dielectric Layer of a HfOx Memristor Taking into Account Single Charged Traps
Russian Microelectronics. 2025. V.54. N8. P.921–927. DOI: 10.1134/S1063739725601821
Идентификаторы БД: Нет идентификаторов
Цитирование в БД: Пока нет цитирований
Альметрики: