Sciact
  • EN
  • RU

Fabrication of Ni-P-B4C coating by cold spraying with subsequent vacuum annealing Full article

Journal Vacuum
ISSN: 0042-207X
Output data Year: 2026, Volume: 245, Article number : 114971, Pages count : DOI: 10.1016/j.vacuum.2025.114971
Tags Cold spray, Plated powder, Boron carbide, Cermet coating
Authors Shikalov Vladislav S. 1,2 , Vidyuk Tomila M. 1,3 , Ukhina Arina V. 3 , Ruktuev Alexey A. 2 , Batraev Igor S. 4
Affiliations
1 Khristianovich Institute of Theoretical and Applied Mechanics SB RAS, Institutskaya str. 4/1, Novosibirsk, 630090, Russia
2 Novosibirsk State Technical University, K. Marx Ave. 20, Novosibirsk, 630073, Russia
3 Institute of Solid State Chemistry and Mechanochemistry SB RAS, Kutateladze str. 18, Novosibirsk, 630090, Russia
4 Lavrentyev Institute of Hydrodynamics SB RAS, Lavrentyev Ave. 15, Novosibirsk, 630090, Russia

Abstract: In the present work, for the first time, a cermet coating was fabricated by cold spraying B4C particles plated with nanocrystalline-amorphous Ni-P alloy. The feedstock powder and coatings were characterized by SEM, EDS and XRD analysis. Hardness measurements and dry friction tests in pair with Si3N4 counterpart were performed to examine the coatings’ properties. The as-sprayed coating was a dense composite based on mixed nanocrystallineamorphous Ni-P matrix containing 21.5 vol% uniformly distributed B4C reinforcements. During spraying, due to a sharp increase in particle temperature upon impact, the content of the nanocrystalline Ni phase increased and a Ni3P phase was formed. Annealing at 400 ◦C resulted in healing of the coating/substrate interface and the intersplat boundaries. After annealing, complete crystallization occurred with an increase in Ni3P phase content. The highest hardness (436.2 HV1) and the lowest specific wear rate (2.7 × 10− 6 mm3/N × m) had a nanocrystallineamorphous coating in the as-sprayed state
Cite: Shikalov V.S. , Vidyuk T.M. , Ukhina A.V. , Ruktuev A.A. , Batraev I.S.
Fabrication of Ni-P-B4C coating by cold spraying with subsequent vacuum annealing
Vacuum. 2026. V.245. 114971 . DOI: 10.1016/j.vacuum.2025.114971
Dates:
Submitted: Oct 27, 2025
Accepted: Nov 30, 2025
Published online: Dec 1, 2025
Identifiers: No identifiers
Citing: Пока нет цитирований
Altmetrics: